IndiumV3, Main, Repository, bibRecord, 002744

Plasma and optical thin film technologies

Identifieur interne : 002744 ( Main/Repository ); précédent : 002743; suivant : 002745

Plasma and optical thin film technologies

Auteurs : RBID : Pascal:12-0083732

Descripteurs français

Pascal (Inist)
- Plasma, Couche mince, Revêtement optique, Composé binaire, Semiconducteur III-V, Indium Phosphure, In P, InP, 0130C, 4279W.

English descriptors

KwdEn :
- Binary compounds, III-V semiconductors, Indium Phosphides, Optical coatings, Plasma, Thin films.

Abstract

The PluTO project is aimed at combining thin-film and plasma technologies. Accordingly, the consortium comprises experts in optical coating (Laser Zentrum Hannover, Fraunhofer IOF) and such in plasma technology (INP Greifswald, Ruhr University of Bochum RUB). The process plasmas available, especially the sheath layers, will be thoroughly. characterized by means of special probes, so that the types, numbers and energies of the particles participating in the coating formation processes can be determined comprehensively in every detail for the first time. The data thus obtained will provide a basis for a numerical modelling of layer growth at atomic scale (Bremen Center for Computational Materials Science BCCMS). The results are expected to deepen the understanding of the physical mechanisms responsible for the influence of plasma action on the layer properties. In parallel, suitable tools for process monitoring will be identified and made available. Some first results have already been achieved which prove the viability of the approach.

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Pascal:12-0083732

Le document en format XML

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<author><name sortKey="Stenzel, O" uniqKey="Stenzel O">O. Stenzel</name>
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<author><name sortKey="Kaiser, N" uniqKey="Kaiser N">N. Kaiser</name>
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<author><name sortKey="Ristau, D" uniqKey="Ristau D">D. Ristau</name>
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<author><name sortKey="Awakowicz, P" uniqKey="Awakowicz P">P. Awakowicz</name>
<affiliation wicri:level="1"><inist:fA14 i1="03"><s1>Ruhr-Universität Bochum, Universitätsstrasse 150</s1>
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<author><name sortKey="Brinkmann, R P" uniqKey="Brinkmann R">R. P. Brinkmann</name>
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<author><name sortKey="Musch, T" uniqKey="Musch T">T. Musch</name>
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<s2>44801 Bochum</s2>
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<author><name sortKey="Rolfes, I" uniqKey="Rolfes I">I. Rolfes</name>
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<s2>44801 Bochum</s2>
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<author><name sortKey="Steffen, H" uniqKey="Steffen H">H. Steffen</name>
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<country>Allemagne</country>
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<author><name sortKey="Foest, R" uniqKey="Foest R">R. Foest</name>
<affiliation wicri:level="1"><inist:fA14 i1="04"><s1>Leibniz-Institut für Plasmaforschung und Technologie e.V., Felix-Hausdorff-Str. 2</s1>
<s2>17489 Greifswald</s2>
<s3>DEU</s3>
<sZ>11 aut.</sZ>
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<wicri:noRegion>17489 Greifswald</wicri:noRegion>
</affiliation>
</author>
<author><name sortKey="Ohl, A" uniqKey="Ohl A">A. Ohl</name>
<affiliation wicri:level="1"><inist:fA14 i1="04"><s1>Leibniz-Institut für Plasmaforschung und Technologie e.V., Felix-Hausdorff-Str. 2</s1>
<s2>17489 Greifswald</s2>
<s3>DEU</s3>
<sZ>11 aut.</sZ>
<sZ>12 aut.</sZ>
<sZ>13 aut.</sZ>
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</author>
<author><name sortKey="Kohler, T" uniqKey="Kohler T">T. Köhler</name>
<affiliation wicri:level="1"><inist:fA14 i1="03"><s1>Ruhr-Universität Bochum, Universitätsstrasse 150</s1>
<s2>44801 Bochum</s2>
<s3>DEU</s3>
<sZ>7 aut.</sZ>
<sZ>8 aut.</sZ>
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<wicri:noRegion>Universitätsstrasse 150</wicri:noRegion>
<wicri:noRegion>44801 Bochum</wicri:noRegion>
</affiliation>
</author>
<author><name sortKey="Dolgonos, G" uniqKey="Dolgonos G">G. Dolgonos</name>
<affiliation wicri:level="3"><inist:fA14 i1="05"><s1>Bremen Center for Computational Materials Science, Bremen University, Am Fallturm 1</s1>
<s2>28359 Bremen</s2>
<s3>DEU</s3>
<sZ>15 aut.</sZ>
<sZ>16 aut.</sZ>
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<country>Allemagne</country>
<placeName><region type="land" nuts="3">Brême (Land)</region>
<settlement type="city">Brême</settlement>
</placeName>
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</author>
<author><name sortKey="Frauenheim, T" uniqKey="Frauenheim T">T. Frauenheim</name>
<affiliation wicri:level="3"><inist:fA14 i1="05"><s1>Bremen Center for Computational Materials Science, Bremen University, Am Fallturm 1</s1>
<s2>28359 Bremen</s2>
<s3>DEU</s3>
<sZ>15 aut.</sZ>
<sZ>16 aut.</sZ>
</inist:fA14>
<country>Allemagne</country>
<placeName><region type="land" nuts="3">Brême (Land)</region>
<settlement type="city">Brême</settlement>
</placeName>
</affiliation>
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</titleStmt>
<publicationStmt><idno type="inist">12-0083732</idno>
<date when="2011">2011</date>
<idno type="stanalyst">PASCAL 12-0083732 INIST</idno>
<idno type="RBID">Pascal:12-0083732</idno>
<idno type="wicri:Area/Main/Corpus">002230</idno>
<idno type="wicri:Area/Main/Repository">002744</idno>
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<seriesStmt><idno type="ISSN">0277-786X</idno>
<title level="j" type="abbreviated">Proc. SPIE Int. Soc. Opt. Eng.</title>
<title level="j" type="main">Proceedings of SPIE, the International Society for Optical Engineering</title>
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<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Binary compounds</term>
<term>III-V semiconductors</term>
<term>Indium Phosphides</term>
<term>Optical coatings</term>
<term>Plasma</term>
<term>Thin films</term>
</keywords>
<keywords scheme="Pascal" xml:lang="fr"><term>Plasma</term>
<term>Couche mince</term>
<term>Revêtement optique</term>
<term>Composé binaire</term>
<term>Semiconducteur III-V</term>
<term>Indium Phosphure</term>
<term>In P</term>
<term>InP</term>
<term>0130C</term>
<term>4279W</term>
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<front><div type="abstract" xml:lang="en">The PluTO project is aimed at combining thin-film and plasma technologies. Accordingly, the consortium comprises experts in optical coating (Laser Zentrum Hannover, Fraunhofer IOF) and such in plasma technology (INP Greifswald, Ruhr University of Bochum RUB). The process plasmas available, especially the sheath layers, will be thoroughly. characterized by means of special probes, so that the types, numbers and energies of the particles participating in the coating formation processes can be determined comprehensively in every detail for the first time. The data thus obtained will provide a basis for a numerical modelling of layer growth at atomic scale (Bremen Center for Computational Materials Science BCCMS). The results are expected to deepen the understanding of the physical mechanisms responsible for the influence of plasma action on the layer properties. In parallel, suitable tools for process monitoring will be identified and made available. Some first results have already been achieved which prove the viability of the approach.</div>
</front>
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<fA08 i1="01" i2="1" l="ENG"><s1>Plasma and optical thin film technologies</s1>
</fA08>
<fA09 i1="01" i2="1" l="ENG"><s1>Advances in optical thin films IV : 5-7 September 2011, Marseille, France</s1>
</fA09>
<fA11 i1="01" i2="1"><s1>STENZEL (O.)</s1>
</fA11>
<fA11 i1="02" i2="1"><s1>WILBRANDT (S.)</s1>
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<fA11 i1="03" i2="1"><s1>KAISER (N.)</s1>
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<fA11 i1="04" i2="1"><s1>SCHMITZ (C.)</s1>
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<fA11 i1="05" i2="1"><s1>TUROWSKI (M.)</s1>
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<fA11 i1="06" i2="1"><s1>RISTAU (D.)</s1>
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<fA11 i1="09" i2="1"><s1>MUSCH (T.)</s1>
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<fA11 i1="14" i2="1"><s1>KÖHLER (T.)</s1>
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<fA11 i1="15" i2="1"><s1>DOLGONOS (G.)</s1>
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<fA11 i1="16" i2="1"><s1>FRAUENHEIM (T.)</s1>
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<s9>ed.</s9>
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<s9>ed.</s9>
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<s9>ed.</s9>
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<fA14 i1="01"><s1>Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7</s1>
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<s3>DEU</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
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<fA14 i1="02"><s1>Laser Zentrum Hannover e.V., Hollerithallee 8</s1>
<s2>30419 Hannover</s2>
<s3>DEU</s3>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>6 aut.</sZ>
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<fA14 i1="03"><s1>Ruhr-Universität Bochum, Universitätsstrasse 150</s1>
<s2>44801 Bochum</s2>
<s3>DEU</s3>
<sZ>7 aut.</sZ>
<sZ>8 aut.</sZ>
<sZ>9 aut.</sZ>
<sZ>10 aut.</sZ>
<sZ>14 aut.</sZ>
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<fA14 i1="04"><s1>Leibniz-Institut für Plasmaforschung und Technologie e.V., Felix-Hausdorff-Str. 2</s1>
<s2>17489 Greifswald</s2>
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<sZ>11 aut.</sZ>
<sZ>12 aut.</sZ>
<sZ>13 aut.</sZ>
</fA14>
<fA14 i1="05"><s1>Bremen Center for Computational Materials Science, Bremen University, Am Fallturm 1</s1>
<s2>28359 Bremen</s2>
<s3>DEU</s3>
<sZ>15 aut.</sZ>
<sZ>16 aut.</sZ>
</fA14>
<fA18 i1="01" i2="1"><s1>SPIE</s1>
<s3>USA</s3>
<s9>org-cong.</s9>
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<fA18 i1="02" i2="1"><s1>POPSud - Optitec</s1>
<s3>FRA</s3>
<s9>org-cong.</s9>
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<fA20><s2>81680L.1-81680L.10</s2>
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<fA21><s1>2011</s1>
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<fA23 i1="01"><s0>ENG</s0>
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<fA25 i1="01"><s1>SPIE</s1>
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<fA60><s1>P</s1>
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<fC01 i1="01" l="ENG"><s0>The PluTO project is aimed at combining thin-film and plasma technologies. Accordingly, the consortium comprises experts in optical coating (Laser Zentrum Hannover, Fraunhofer IOF) and such in plasma technology (INP Greifswald, Ruhr University of Bochum RUB). The process plasmas available, especially the sheath layers, will be thoroughly. characterized by means of special probes, so that the types, numbers and energies of the particles participating in the coating formation processes can be determined comprehensively in every detail for the first time. The data thus obtained will provide a basis for a numerical modelling of layer growth at atomic scale (Bremen Center for Computational Materials Science BCCMS). The results are expected to deepen the understanding of the physical mechanisms responsible for the influence of plasma action on the layer properties. In parallel, suitable tools for process monitoring will be identified and made available. Some first results have already been achieved which prove the viability of the approach.</s0>
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<s5>03</s5>
</fC03>
<fC03 i1="01" i2="3" l="ENG"><s0>Plasma</s0>
<s5>03</s5>
</fC03>
<fC03 i1="02" i2="3" l="FRE"><s0>Couche mince</s0>
<s5>47</s5>
</fC03>
<fC03 i1="02" i2="3" l="ENG"><s0>Thin films</s0>
<s5>47</s5>
</fC03>
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<s5>48</s5>
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<fC03 i1="03" i2="3" l="ENG"><s0>Optical coatings</s0>
<s5>48</s5>
</fC03>
<fC03 i1="04" i2="3" l="FRE"><s0>Composé binaire</s0>
<s5>50</s5>
</fC03>
<fC03 i1="04" i2="3" l="ENG"><s0>Binary compounds</s0>
<s5>50</s5>
</fC03>
<fC03 i1="05" i2="3" l="FRE"><s0>Semiconducteur III-V</s0>
<s5>51</s5>
</fC03>
<fC03 i1="05" i2="3" l="ENG"><s0>III-V semiconductors</s0>
<s5>51</s5>
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<fC03 i1="06" i2="3" l="FRE"><s0>Indium Phosphure</s0>
<s2>NC</s2>
<s2>NA</s2>
<s5>52</s5>
</fC03>
<fC03 i1="06" i2="3" l="ENG"><s0>Indium Phosphides</s0>
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<s2>NA</s2>
<s5>52</s5>
</fC03>
<fC03 i1="07" i2="3" l="FRE"><s0>In P</s0>
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<fC03 i1="08" i2="3" l="FRE"><s0>InP</s0>
<s4>INC</s4>
<s5>83</s5>
</fC03>
<fC03 i1="09" i2="3" l="FRE"><s0>0130C</s0>
<s4>INC</s4>
<s5>84</s5>
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<fC03 i1="10" i2="3" l="FRE"><s0>4279W</s0>
<s4>INC</s4>
<s5>85</s5>
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<fN21><s1>065</s1>
</fN21>
<fN44 i1="01"><s1>OTO</s1>
</fN44>
<fN82><s1>OTO</s1>
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</pA>
<pR><fA30 i1="01" i2="1" l="ENG"><s1>Advances in optical thin films. Conference</s1>
<s2>04</s2>
<s3>Marseille FRA</s3>
<s4>2011-09-05</s4>
</fA30>
</pR>
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   |texte=   Plasma and optical thin film technologies
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Plasma and optical thin film technologies

Plasma and optical thin film technologies

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